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DR.-ING. MORITZ OBERBERG
Wissenschaftlicher Mitarbeiter
Adresse:
Ruhr-Universität Bochum
Fakultät für Elektrotechnik und Informationstechnik
Lehrstuhl für Angewandte Elektrodynamik und Plasmatechnik
Universitätsstraße 150
D-44801 Bochum
Raum:
ICN 02/639
Telefon:
(+49)(0)234 / 32 – 25525
Fax:
(+49)(0)234-32-14230
E-Mail:
oberberg(at)aept.rub.de
Veröffentlichungen
Eremin, D., Engel, D., Krüger, D., Wilczek, S., Berger, B., Oberberg, M., Wölfel, C., Smolyakov, A., Lunze, J., Awakowicz, P., Schulze, J., & Brinkmann, R. P. (2023). Electron dynamics in planar radio frequency magnetron plasmas: I. The mechanism of Hall heating and the µ-mode. Plasma Sources Science and Technology, 32(4), 045007. https://doi.org/10.1088/1361-6595/acc481 Cite
Eremin, D., Berger, B., Engel, D., Kallähn, J., Köhn, K., Krüger, D., Xu, L., Oberberg, M., Wölfel, C., Lunze, J., Awakowicz, P., Schulze, J., & Brinkmann, R. P. (2023). Electron dynamics in planar radio frequency magnetron plasmas: II. Heating and energization mechanisms studied via a 2d3v particle-in-cell/Monte Carlo code. Plasma Sources Science and Technology, 32(4), 045008. https://doi.org/10.1088/1361-6595/acc47f Cite
Berger, B., Eremin, D., Oberberg, M., Engel, D., Wölfel, C., Zhang, Q.-Z., Awakowicz, P., Lunze, J., Brinkmann, R. P., & Schulze, J. (2023). Electron dynamics in planar radio frequency magnetron plasmas: III. Comparison of experimental investigations of power absorption dynamics to simulation results. Plasma Sources Science and Technology, 32(4), 045009. https://doi.org/10.1088/1361-6595/acc480 Cite
Roggendorf, J., Berger, B., Eremin, D., Oberberg, M., Engel, D., Wölfel, C., Zhang, Q.-Z., Awakowicz, P., Lunze, J., & Schulze, J. (2022). Experimental investigations of plasma dynamics in the hysteresis regime of reactive RF sputter processes. Plasma Sources Science and Technology, 31(6), 065007. https://doi.org/10.1088/1361-6595/ac7413 Cite
Oberrath, J., Friedrichs, M., Gong, J., Oberberg, M., Pohle, D., Schulz, C., Wang, C., Awakowicz, P., Brinkmann, R. P., Lapke, M., Mussenbrock, T., Musch, T., & Rolfes, I. (2021). On the Multipole Resonance Probe: Current Status of Research and Development. IEEE Transactions on Plasma Science, 49(11), 3293–3298. https://doi.org/10.1109/TPS.2021.3113832 Cite
Woelfel, C., Oberberg, M., Berger, B., Engel, D., Brinkmann, R. P., Schulze, J., Awakowicz, P., & Lunze, J. (2021). Control-oriented plasma modeling and controller design for reactive sputtering. IFAC Journal of Systems and Control, 16, 100142. https://doi.org/10.1016/j.ifacsc.2021.100142 Cite
Oberberg, M., Berger, B., Buschheuer, M., Engel, D., Wölfel, C., Eremin, D., Lunze, J., Brinkmann, R. P., Awakowicz, P., & Schulze, J. (2020). The magnetic asymmetry effect in geometrically asymmetric capacitively coupled radio frequency discharges operated in Ar/O 2. Plasma Sources Science and Technology, 29(7), 075013. https://doi.org/10.1088/1361-6595/ab9b31 Cite
Pohle, D., Schulz, C., Oberberg, M., Awakowicz, P., & Rolfes, I. (2020). The Planar Multipole Resonance Probe: A Minimally Invasive Monitoring Concept for Plasma-Assisted Dielectric Deposition Processes. IEEE Transactions on Microwave Theory and Techniques, 68(6), 2067–2079. https://doi.org/10.1109/TMTT.2020.2974835 Cite
Oberberg, M., Engel, D., Berger, B., Wölfel, C., Eremin, D., Lunze, J., Brinkmann, R. P., Awakowicz, P., & Schulze, J. (2019). Magnetic control of nonlinear electron resonance heating in a capacitively coupled radio frequency discharge. Plasma Sources Science and Technology, 28(11), 115021. https://doi.org/10.1088/1361-6595/ab53a0 Cite
Woelfel, C., Oberberg, M., Berger, B., Engel, D., Brinkmann, R. P., Awakowicz, P., Lunze, J., & Schulze, J. (2019). The Multipole Resonance Probe-based controller: a technology to investigate plasma-based deposition. Journal of Instrumentation, 14(10), P10007–P10007. https://doi.org/10.1088/1748-0221/14/10/P10007 Cite
Pohle, D., Schulz, C., Oberberg, M., Awakowicz, P., & Rolfes, I. (2019). Minimally Invasive Supervision of Plasma-assisted Dielectric Deposition Processes. 2019 IEEE MTT-S International Microwave Workshop Series on Advanced Materials and Processes for RF and THz Applications (IMWS-AMP), 163–165. https://doi.org/10.1109/IMWS-AMP.2019.8880124 Cite
Woelfel, C., Oberberg, M., Awakowicz, P., & Lunze, J. (2019). Plasma State Control of Reactive Sputter Processes. International Conference of Control, Dynamic Systems, and Robotics. https://doi.org/10.11159/cdsr19.107 Cite
Kirchheim, D., Wilski, S., Jaritz, M., Mitschker, F., Oberberg, M., Trieschmann, J., Banko, L., Brochhagen, M., Schreckenberg, R., Hopmann, C., Böke, M., Benedikt, J., de los Arcos, T., Grundmeier, G., Grochla, D., Ludwig, A., Mussenbrock, T., Brinkmann, R. P., Awakowicz, P., & Dahlmann, R. (2019). Improved homogeneity of plasma and coating properties using a lance matrix gas distribution in MW-PECVD. Journal of Coatings Technology and Research, 16(2), 573–583. https://doi.org/10.1007/s11998-018-0138-4 Cite
Oberberg, M., Kallähn, J., Awakowicz, P., & Schulze, J. (2018). Experimental investigations of the magnetic asymmetry effect in capacitively coupled radio frequency plasmas. Plasma Sources Science and Technology, 27(10), 105018. https://doi.org/10.1088/1361-6595/aae199 Cite
Pohle, D., Schulz, C., Oberberg, M., Friedrichs, M., Serwa, A., Uhlig, P., Oberrath, J., Awakowicz, P., & Rolfes, I. (2018). A Stacked Planar Sensor Concept for Minimally Invasive Plasma Monitoring. 2018 Asia-Pacific Microwave Conference (APMC), 1315–1317. https://doi.org/10.23919/APMC.2018.8617552 Cite
Pohle, D., Schulz, C., Oberberg, M., Serwa, A., Uhlig, P., Awakowicz, P., & Rolfes, I. (2018). Progression of the Multipole Resonance Probe: Advanced Plasma Sensors Based on LTCC-Technology. 2018 48th European Microwave Conference (EuMC), 239–242. https://doi.org/10.23919/EuMC.2018.8541730 Cite
Pohle, D., Schulz, C., Rolfes, I., Oberberg, M., Awakowicz, P., Serwa, A., & Uhlig, P. (2018). An advanced high-temperature stable multipole resonance probe for industry compatible plasma diagnostics. 2018 11th German Microwave Conference (GeMiC), 235–238. https://doi.org/10.23919/GEMIC.2018.8335073 Cite
Foest, R., Wauer, J., Stenzel, O., Wilbrandt, S., Franke, C., Oberberg, M., Harhausen, J., & Brinkmann, R. P. (2017). Prospects for the enhancement of PIAD processes by plasma diagnostics. In J. L. Bentley & S. Stoebenau (Eds.), Optifab 2017 (p. 69). SPIE. https://doi.org/10.1117/12.2279800 Cite
Fiebrandt, M., Oberberg, M., & Awakowicz, P. (2017). Comparison of Langmuir probe and multipole resonance probe measurements in argon, hydrogen, nitrogen, and oxygen mixtures in a double ICP discharge. Journal of Applied Physics, 122(1), 013302. https://doi.org/10.1063/1.4991493 Cite
Mallach, M., Oberberg, M., Awakowicz, P., & Musch, T. (2017). Fast broadband reflectometer for diagnostics of plasma processes based on spatially distributed multipole resonance probes. 2017 IEEE MTT-S International Microwave Symposium (IMS), 1022–1025. https://doi.org/10.1109/MWSYM.2017.8058765 Cite
Schulz, C., Rolfes, I., Oberberg, M., & Awakowicz, P. (2016). Collision frequency determination of low-pressure plasmas based on RF-reflectometry. 2016 46th European Microwave Conference (EuMC), 807–810. https://doi.org/10.1109/EuMC.2016.7824466 Cite
Oberberg, M., Ries, S., Bibinov, N., & Awakowicz, P. (2016). Measurements of electron density in different low pressure plasmas using the multipole resonance probe, langmuir probe and optical emission spectroscopy. 2016 IEEE International Conference on Plasma Science (ICOPS), 1–1. https://doi.org/10.1109/PLASMA.2016.7534183 Cite
Runkel, J., Schulz, C., Rolfes, I., Oberberg, M., & Awakowicz, P. (2016). Monitoring of low pressure plasmas with a calibrated probe. 2016 German Microwave Conference (GeMiC), 43–46. https://doi.org/10.1109/GEMIC.2016.7461551 Cite
Schulz, C., Runkel, J., Oberberg, M., Awakowicz, P., & Rolfes, I. (2016). Diagnostics of Plasma Processes Based on Parallelized Spatially Resolved In-Situ Reflection Measurements. IEEE Transactions on Microwave Theory and Techniques, 1–1. https://doi.org/10.1109/TMTT.2015.2510653 Cite
Weber, C., Oberberg, M., Weber, D., Bock, C., Pham, D. V., & Kunze, U. (2014). Improved Morphology and Performance of Solution-Processed Metal-Oxide Thin-Film Transistors Due to a Polymer Based Interface Modifier. Advanced Materials Interfaces, 1(7), 1400137. https://doi.org/10.1002/admi.201400137 Cite
