BIRK BER­GER, M. SC.

Wis­sen­schaft­li­cher Mit­ar­bei­ter

Adresse:
Ruhr-Uni­ver­si­tät Bo­chum
Fakultät für Elektrotechnik und Informationstechnik
Lehr­stuhl für All­ge­mei­ne Elek­tro­tech­nik und Plas­ma­tech­nik (AEPT)
Uni­ver­si­täts­stra­ße 150
D-44801 Bo­chum

Raum:
ID 1/529

Te­le­fon:
(+49)(0)234 / 32 – 29845

Fax:
(+49)(0)234-32-14230

E-Mail:
berger(at)aept.rub.de

Veröffentlichungen

Woelfel, C., Oberberg, M., Berger, B., Engel, D., Brinkmann, R. P., Schulze, J., Awakowicz, P., & Lunze, J. (2021). Control-oriented plasma modeling and controller design for reactive sputtering. IFAC Journal of Systems and Control, 16, 100142. https://doi.org/10.1016/j.ifacsc.2021.100142 Cite
Liu, Y., Trieschmann, J., Berger, B., Schulze, J., & Mussenbrock, T. (2021). Non-linear effects and electron heating dynamics in radio-frequency capacitively coupled plasmas with a non-uniform transverse magnetic field. Physics of Plasmas, 28(5), 053505. https://doi.org/10.1063/5.0045947 Cite
Hartmann, P., Wang, L., Nösges, K., Berger, B., Wilczek, S., Brinkmann, R. P., Mussenbrock, T., Juhasz, Z., Donkó, Z., Derzsi, A., Lee, E., & Schulze, J. (2021). Control of electron velocity distributions at the wafer by tailored voltage waveforms in capacitively coupled plasmas to compensate surface charging in high-aspect ratio etch features. Journal of Physics D: Applied Physics, 54, 255202. https://doi.org/10.1088/1361-6463/abf229 Cite
Oberberg, M., Berger, B., Buschheuer, M., Engel, D., Wölfel, C., Eremin, D., Lunze, J., Brinkmann, R. P., Awakowicz, P., & Schulze, J. (2020). The magnetic asymmetry effect in geometrically asymmetric capacitively coupled radio frequency discharges operated in Ar/O 2. Plasma Sources Science and Technology, 29(7), 075013. https://doi.org/10.1088/1361-6595/ab9b31 Cite
Hartmann, P., Wang, L., Nösges, K., Berger, B., Wilczek, S., Brinkmann, R. P., Mussenbrock, T., Juhasz, Z., Donkó, Z., Derzsi, A., Lee, E., & Schulze, J. (2020). Charged particle dynamics and distribution functions in low pressure dual-frequency capacitively coupled plasmas operated at low frequencies and high voltages. Journal of Applied Physics, 54, 075014. https://doi.org/10.1088/1361-6595/ab9374 Cite
Oberberg, M., Engel, D., Berger, B., Wölfel, C., Eremin, D., Lunze, J., Brinkmann, R. P., Awakowicz, P., & Schulze, J. (2019). Magnetic control of nonlinear electron resonance heating in a capacitively coupled radio frequency discharge. Plasma Sources Science and Technology, 28(11), 115021. https://doi.org/10.1088/1361-6595/ab53a0 Cite
Woelfel, C., Oberberg, M., Berger, B., Engel, D., Brinkmann, R. P., Awakowicz, P., Lunze, J., & Schulze, J. (2019). The Multipole Resonance Probe-based controller: a technology to investigate plasma-based deposition. Journal of Instrumentation, 14(10), P10007–P10007. https://doi.org/10.1088/1748-0221/14/10/P10007 Cite
Brandt, S., Berger, B., Donkó, Z., Derzsi, A., Schüngel, E., Koepke, M., & Schulze, J. (2019). Control of charged particle dynamics in capacitively coupled plasmas driven by tailored voltage waveforms in mixtures of Ar and CF 4. Plasma Sources Science and Technology, 28(9), 095021. https://doi.org/10.1088/1361-6595/ab3c7c Cite
Daksha, M., Derzsi, A., Zaka-ul-Islam, M., Schulenberg, D., Berger, B., Donkó, Z., & Schulze, J. (2019). Material dependent modeling of secondary electron emission coefficients and its effects on PIC/MCC simulation results of capacitive RF plasmas. Plasma Sources Science and Technology, 28(3), 034002. https://doi.org/10.1088/1361-6595/ab094f Cite
Berger, B., You, K., Lee, H.-C., Mussenbrock, T., Awakowicz, P., & Schulze, J. (2018). Observation of the generation of multiple electron beams during a single sheath expansion phase in capacitive RF plasmas. Plasma Sources Science and Technology, 27(12), 12LT02. https://doi.org/10.1088/1361-6595/aaefc7 Cite
Donkó, Z., Derzsi, A., Korolov, I., Hartmann, P., Brandt, S., Schulze, J., Berger, B., Koepke, M., Bruneau, B., Johnson, E., Lafleur, T., Booth, J.-P., Gibson, A. R., O’Connell, D., & Gans, T. (2018). Experimental benchmark of kinetic simulations of capacitively coupled plasmas in molecular gases. Plasma Physics and Controlled Fusion, 60(1), 014010. https://doi.org/10.1088/1361-6587/aa8378 Cite
Berger, B., Steinberger, T., Schüngel, E., Koepke, M., Mussenbrock, T., Awakowicz, P., & Schulze, J. (2017). Enhanced power coupling efficiency in inductive discharges with RF substrate bias driven at consecutive harmonics with adjustable phase. Applied Physics Letters, 111(20), 201601. https://doi.org/10.1063/1.5000144 Cite
Brandt, S., Berger, B., Schüngel, E., Korolov, I., Derzsi, A., Bruneau, B., Johnson, E., Lafleur, T., O’Connell, D., Koepke, M., Gans, T., Booth, J.-P., Donkó, Z., & Schulze, J. (2016). Electron power absorption dynamics in capacitive radio frequency discharges driven by tailored voltage waveforms in CF 4. Plasma Sources Science and Technology, 25(4), 045015. https://doi.org/10.1088/0963-0252/25/4/045015 Cite
Daksha, M., Berger, B., Schuengel, E., Korolov, I., Derzsi, A., Koepke, M., Donkó, Z., & Schulze, J. (2016). A computationally assisted spectroscopic technique to measure secondary electron emission coefficients in radio frequency plasmas. Journal of Physics D: Applied Physics, 49(23), 234001. https://doi.org/10.1088/0022-3727/49/23/234001 Cite
Berger, B., Brandt, S., Franek, J., Schüngel, E., Koepke, M., Mussenbrock, T., & Schulze, J. (2015). Experimental investigations of electron heating dynamics and ion energy distributions in capacitive discharges driven by customized voltage waveforms. Journal of Applied Physics, 118(22), 223302. https://doi.org/10.1063/1.4937403 Cite
Franek, J., Brandt, S., Berger, B., Liese, M., Barthel, M., Schüngel, E., & Schulze, J. (2015). Power supply and impedance matching to drive technological radio-frequency plasmas with customized voltage waveforms. Review of Scientific Instruments, 86(5), 053504. https://doi.org/10.1063/1.4921399 Cite
de_DE