Researcher
Address
Ruhr-Universität Bochum
Fakultät für Elektrotechnik und Informationstechnik
Angewandte Elektrodynamik und Plasmatechnik
Universitätsstraße 150
D-44801 Bochum, Germany
Room
ID 1/533
Phone
+49 234 32 29478
Email
noesges(at)aept.rub.de
Publications
2825793
Nösges
apa
50
date
desc
year
1
Nösges
432
https://www.aept.ruhr-uni-bochum.de/wp-content/plugins/zotpress/
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Nösges, K., Klich, M., Derzsi, A., Horváth, B., Schulze, J., Brinkmann, R. P., Mussenbrock, T., & Wilczek, S. (2023). Nonlocal dynamics of secondary electrons in capacitively coupled radio frequency discharges. Plasma Sources Science and Technology, 32(8), 085008. https://doi.org/10.1088/1361-6595/ace848 Cite
Hartmann, P., Wang, L., Nösges, K., Berger, B., Wilczek, S., Brinkmann, R. P., Mussenbrock, T., Juhasz, Z., Donkó, Z., Derzsi, A., Lee, E., & Schulze, J. (2021). Control of electron velocity distributions at the wafer by tailored voltage waveforms in capacitively coupled plasmas to compensate surface charging in high-aspect ratio etch features. Journal of Physics D: Applied Physics, 54, 255202. https://doi.org/10.1088/1361-6463/abf229 Cite
Hartmann, P., Wang, L., Nösges, K., Berger, B., Wilczek, S., Brinkmann, R. P., Mussenbrock, T., Juhasz, Z., Donkó, Z., Derzsi, A., Lee, E., & Schulze, J. (2020). Charged particle dynamics and distribution functions in low pressure dual-frequency capacitively coupled plasmas operated at low frequencies and high voltages. Plasma Sources Science and Technology, 54, 075014. https://doi.org/10.1088/1361-6595/ab9374 Cite