Researcher
Address
Ruhr-Universität Bochum
Fakultät für Elektrotechnik und Informationstechnik
Angewandte Elektrodynamik und Plasmatechnik
Universitätsstraße 150
D-44801 Bochum, Germany
Room
ID 1/529
Phone
+49 234 32 12157
Email
giesekus(at)aept.rub.de
Publications
2825793
Giesekus
apa
50
date
desc
year
1
Giesekus
664
https://www.aept.ruhr-uni-bochum.de/wp-content/plugins/zotpress/
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Chen, Z., Chen, Z., Wang, Y., Giesekus, J., Jiang, W., Ding, Y., Xia, D., Zhang, Y., & Schulze, J. (2026). Control of electron energy probability function by current waveform tailoring in inductively coupled radio frequency plasmas. Physics of Plasmas, 33(9), 093506. https://doi.org/10.1063/5.0343175 Cite
Giesekus, J., Pletzer, A., Beckfeld, F., Noesges, K., Bock, C., & Schulze, J. (2025). Multi-diagnostic characterization of inductively coupled discharges with tailored waveform substrate bias for precise control of plasma etching. Plasma Sources Science and Technology, 34(11), 115015. https://doi.org/10.1088/1361-6595/ae2158 Cite
Böddecker, A., Bodnar, A., Schücke, L., Giesekus, J., Wenselau, K., Nguyen-Smith, R. T., Oppotsch, T., Oberste-Beulmann, C., Muhler, M., Gibson, A. R., & Awakowicz, P. (2022). A scalable twin surface dielectric barrier discharge system for pollution remediation at high gas flow rates. Reaction Chemistry & Engineering, 10.1039.D2RE00167E. https://doi.org/10.1039/D2RE00167E Cite