Spectroscopic and Microscopic Investigations of Degradation Processes in Polymer Surface-Near Regions During the Deposition of SiOx Films

Felix Mitschker, Dietrich, Jan, Ozkaya, Berkem, de los Arcos, Teresa, Giner, Ignaci, Peter Awakowicz, Grundmeier, Guido

PLASMA PROCESSES AND POLYMERS Volume: 12 Issue: 9 Pages: 1002-1009 Special Issue: SI DOI: 10.1002/ppap.201500085 Published: SEP 2015


Atomic oxygen densities and fluences in a microwave plasma are determined by means of optical emission spectroscopy for different oxygen to hexamethyldisiloxane (HMDSO) ratios during deposition of SiOx and SiOxCyHz like coatings on molecularly defined organic surfaces. The plasma coatings are deposited on octadecanethiol self-assembled monolayers that serve as a sensor layer. They are used for tracing the interfacial changes induced during plasma deposition as a function of the O-2 to HMDSO ratio and absolutely quantified atomic oxygen fluence. The interfacial chemical changes are monitored by means of polarization modulation IR reflection-absorption spectroscopy. The data reveal that significant oxidative degradation of the sensor layer is reached for exposure to an atomic oxygen fluence of 1.0.10(22) m(-2).