Multiple frequency capacitively coupled plasmas as a new technology for sputter processes
Stefan Bienholz, Nikita Bibinov, Peter Awakowicz
JOURNAL OF PHYSICS D-APPLIED PHYSICS, Volume: 46, Issue: 8, Article Number: 084010, DOI: 10.1088/0022-3727/46/8/084010, Published: FEB 27 2013
A novel large area multiple frequency coupled plasma is introduced for sputter deposition purposes. The discharge is driven by three different excitation frequencies (13.56, 27.12 and 60 MHz) simultaneously for advanced control of Ar ion flux and energy at the target by applying the electrical asymmetry effect during sputter processes.
Optical emission spectroscopy is performed to characterize the sputter plasma with respect to plasma parameters as well as the Al transport through the plasma. The spectroscopic data are compared with TRIDYN calculation in combination with a simulation of the transport of atoms through the plasma volume.