KA­THA­RI­NA NÖS­GES, M. SC.

Scientific Assistant

Address:
Ruhr Uni­ver­si­ty Bo­chum
Faculty of Electrical Engineering and Information Technology
Chair of Applied Electrodynamics and Plasma Technology
Uni­ver­si­taets­stra­sse 150
D-44801 Bo­chum, Germany

Room:
ID 1/133

Phone:
(+49)(0)234 / 32 – 26343

Fax:
(+49)(0)234-32-14230

E-Mail:
noesges(at)aept.rub.de

Publications

Hartmann, P., Wang, L., Nösges, K., Berger, B., Wilczek, S., Brinkmann, R. P., Mussenbrock, T., Juhasz, Z., Donkó, Z., Derzsi, A., Lee, E., & Schulze, J. (2021). Control of electron velocity distributions at the wafer by tailored voltage waveforms in capacitively coupled plasmas to compensate surface charging in high-aspect ratio etch features. Journal of Physics D: Applied Physics, 54, 255202. https://doi.org/10.1088/1361-6463/abf229 Cite
Hartmann, P., Wang, L., Nösges, K., Berger, B., Wilczek, S., Brinkmann, R. P., Mussenbrock, T., Juhasz, Z., Donkó, Z., Derzsi, A., Lee, E., & Schulze, J. (2020). Charged particle dynamics and distribution functions in low pressure dual-frequency capacitively coupled plasmas operated at low frequencies and high voltages. Journal of Applied Physics, 54, 075014. https://doi.org/10.1088/1361-6595/ab9374 Cite
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