Understanding-based process development is only possible with excellent diagnostics and simulation methods. Optical emission and absorption spectroscopy, highspeed imaging, probe diagnostics, mass spectrometry, and substrate diagnostics enable a profound plasma diagnostics. From the plasma simulation side we are able to rely on different approaches. Based on this, a linking of diagnostics and simulation facilitates an extensive plasma process analysis.

IEDF Sensor

Wafer-level sensor structure for measurements of the ion energy distribution function and the ion angle distribution function in low-pressure plasmas

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Nano Security

Physically Unclonable Functions (PUF) and True Random Number Generation (TRNG) are two components that are widely used today to generate random bit streams in security applications.

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