Material- and Surface Processing

Coating and etching processes constitute a broad field in plasma technology. We work on different plasma coating processes, from low pressure systems up to plasma in liquids. Understanding these processes is the base to specifically adjust and control process parameter and consequently coating characteristics and develop new coating systems.

CCP

2D Particle-in-Cell

Realistic 2D Particle-in-Cell simulations of charged particle dynamics in low pressure capacitively coupled radio frequency plasmas

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Plasmajet

CO2 Jet

Controlling the electron dynamics in radio-frequency driven micro plasma jets for efficient CO2 conversion

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House of Plasma

With the help of the MRP, direct internal parameters can be recorded stable in real time for plasma-based surface treatments.

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Plasmen in Flüssigkeit

SFB 1316 B5

Plasma electrolytic oxidation belongs to the huge and growing research field of plasmas in liquids.

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Mikrowellenentladungen

SFB TR87 B4

Plasma diagnostics of pulsed microwave plasmas with HF-bias combined with plasma-enhanced atomic layer deposition for the deposition of multilayer SiOx gradient coatings as barrier coating of flexible polymers

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CCP

SFB TR87 C1

In subproject C1, a novel reactor concept for reactive sputtering processes in the form of a large-area capacitively coupled multi-frequency discharge (MFCCP) is developed, characterized and optimized.

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Mikrowellenentladungen

SFB TR87 T06

Low-maintenance continuous Air2Air PECVD film coating by In-Plasma concept

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